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Ivoyl P. Koutsaroff

Ivoyl P. Koutsaroff

Senior Member of Technical Staff
Qorvo Inc
USA

Biography

Dr. Ivoyl P. Koutsaroff is a Senior Member of Technical Staff working on new metal alloyed electrodes and doped oxide materials targeting improvement of acoustic wave filters’ performances, Technology R&D, Qorvo Inc., Apopka, Florida, USA. Prior to joining Qorvo, since 2005, for a decade, he was working as Principle Research Engineer at New Technology Center, Murata Manufacturing Co., Ltd., Kyoto, Japan, responsible for ferroelectric thin film research, new functional oxide and electrode materials development, process integration and performance improvement of various rf-front-end devices (e.g., BST varactors and piezo-MEMS). He was core member of a national join collaborative project supported by the Japan Society for the Promotion of Science (JSPS) for development of tunable SAW filters combined with BST varactors monolithically integrated on the same chip. Since 1994, he had held several research and engineering positions at the Centre for Advanced Nanotechnology (ECAN), University of Toronto, Canada; Advanced Power Electronics Research Center at the AIST, Tsukuba, Japan; The GAO Materials Chemistry Research Group, University of Toronto; E&G Optoelectronics (Perkin-Elmer Optoelectronics), Montreal, Quebec and ComDev International Ltd., Cambridge, Ontario, Canada. From 1999 to 2005 he has been engaged in manufacturing and development activities at Gennum Corporation (acquired by Semtech and ON Semiconductor) in Burlington, Ontario, Canada, where he was a Senior Technology Development Engineer, involved with development of low dielectric loss high density ferroelectric thin film decoupling and tunable capacitor devices used in RF-front-end communication modules and hearing aids applications. Being a manufacturing engineer from 1998 to 2001, he was actively involved in Statistical Process Control (SPC) and continuous process improvement activities for Plasma Enhanced Chemical Vapor Deposition (PECVD), Reactive Ion etching (RIE), RF sputtering, and Rapid Thermal Annealing (RTA) steps in different semiconductor class thin film devices production lines. His quality control optimization and monitoring methodology led to significant improvement of overall yield and robustness of the above processing steps used for the microdevice fabrication. He was a licensed Professional Engineer (P.Eng) in Ontario, Canada. He has authored more than 80 publications in the fields of III-V semiconductors deep levels, optical characterization of GaAs, AlGaAs, InP, GaN; dielectric and microwave properties of BST thin films, novel oxynitride perovskite dielectric thin film materials through combinatorial compositional and stoichiometric ratio libraries, and novel high density thin film capacitor device concept. In 2010 he received Murata Manufacturing’s Vice-President Special Technology Development and Innovation Award for the first industrial scalable fabrication of oxynitride perovskite dielectric thin films with enhanced performances. He has co-organized The Ferroelectric Thin Film Symposium as part of the MRS symposia (2003) and he chaired various international conferences, workshops and symposia. Dr. Koutsaroff founded and organized the First International Symposium on “Advances and Enhanced Functionalities of Anion-controlled New Inorganic Materials (ANIM1)”, as part of E-MRS 2013 Spring Meeting which was held in Strasbourg, France, May 27-31, 2013. He was the lead Guest-Editor of the Special Issue on ANIM materials of the ACS Journal of Crystal Growth & Design (2013-2014). He was also founder and organizer of Kyoto Innovation Forum (KIF) seminars for the corporate executives and academia within Japan with lecturers invited from prestigious researcher organizations and private firms within Japan. Dr. Koutsaroff has given invited lectures at ISIF Symposia, MRS Symposia, FMA, ISAF, Ceramics Society of Japan, ICC3, ISSP, WCAM-2013, WCSM-2015, E-MRS 2015, etc. conferences as well various industrial R&C Centers in Japan, USA, Canada, Germany, France and Switzerland, co-edited proceedings in the ferroelectric thin films field, and he holds more than 40 patents. He is a member of the IEEE, the Materials Research Society (MRS), the American Chemical Society (ACS), ASM International and the Electrochemical Society (ECS). He also an Editorial Board Member of AU Journal of Technology, Assumption University, Thailand. Regular referee for JAP, APL and APL Materials, American Physical Society publications. He received his M.Sc. degree in Applied Physics from Sofia University in 1986, and his Ph.D. degree in Semiconductor Material Physics from Sun-Yat Sen University and Institute of Semiconductors, Chinese Academy of Sciences in 1933.

Research Interest